Below is a description of the Von Ardenne Rotatable Magnetron Sputter Cathode. Sputter cathodes are used to provide vapor fluxes for thin film coating in vacuum. Precise and adherent coatings.
The rationale for the rotating tube source cathode is to increase cathode material utilization and is a specific counterpoint to why developing one's own rotating cathode as part of a startup strategy is a rather expensive development effort, not part of critical path to a film based manufacturing strategy.
MAGNETRON SPUTTER SOURCE - Application
Sputter source for high-rate coating of large-area substrates in linear motion with metallic and insulating layers, preferably applied in production and pilot plants
MAGNETRON SPUTTER SOURCE - Features
* Sputter source consists of two rotatable cathode tubes with magnetic system and with two Endblocks for drive, power supply and cooling edge
* External drive, cooling water and power supply
* Compact target tubes or basic tube with bonded, sprayed or cast target material
* Direct target cooling
* Option: Single Rotatable Magnetron, sputter source with single target tube
MAGNETRON SPUTTER SOURCE Technical Data
* Target utilization 70 to 80 %
* Target ext. diameter 145 to 160 mm
* Target inner diameter 125 mm
* Target length, in steps of 50 mm 1,000 to 3,850 mm
* Power supply, MF, max. 200 kW
* MF current, max. 400 A
Rotatable Magnetron Sputter Source RDM, developed and manufactured by VON ARDENNE
Clearly the curious question to ask is - Why develop your own rotating tubular magnetron?